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1

[IEEE IEEE International Interconnect Technology Conference - Burlingame, CA, USA (2-4 June 2003)] Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695) - Leakage and breakdown mechanisms in Cu damascene with a bilayer-structured α-SiCN/α-SiC dielectric barrier

Chiu-Chih Chiang,, I-Hsiu Ko,, Mao-Chieh Chen,, Zhen-Cheng Wu,, Yung-Cheng Lu,, Syun-Ming Jang,, Mong-Song Liang,

Année:

2003

Langue:

english

Fichier:

PDF, 252 KB

english, 2003

2

Leakage mechanism in Cu damascene structure with methylsilane-doped low-K CVD oxide as intermetal dielectric

Zhen-Cheng Wu,, Chiu-Chih Chiang,, Wei-Hao Wu,, Mao-Chieh Chen,, Shwang-Ming Jeng,, Lain-Jong Li,, Syun-Ming Jang,, Chen-Hua Yu,, Mong-Song Liang,

Journal:

IEEE Electron Device Letters

Année:

2001

Langue:

english

Fichier:

PDF, 234 KB

english, 2001

3

[American Vacuum Soc 2002 7th International Symposium on Plasma- and Process-Induced Damage - Maui, HI, USA (5-7 June 2002)] 7th International Symposium on Plasma- and Process-Induced Damage - Plasma damage reduction for high density plasma CVD phosphosilicate glass process

Sunway Chen,, Chu-Yun Fu,, Syun-Ming Jang,, Chen-Hua Yu,, Mong-Song Liang,

Année:

2002

Langue:

english

Fichier:

PDF, 175 KB

english, 2002

4

Physical and Barrier Properties of Amorphous Silicon-Oxycarbide Deposited by PECVD from Octamethylcyclotetrasiloxane

Chiang, Chiu-Chih, Chen, Mao-Chieh, Li, Lain-Jong, Wu, Zhen-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 185 KB

english, 2004

5

Mechanical property analyses of porous low-dielectric-constant films for stability evaluation of multilevel-interconnect structures

Shou-Yi Chang, Hui-Lin Chang, Yung-Cheng Lu, Syun-Ming Jang, Su-Jien Lin, Mong-Song Liang

Journal:

Thin Solid Films

Année:

2004

Langue:

english

Fichier:

PDF, 636 KB

english, 2004

6

Properties and thermal stability of porous organic low-dielectric-constant materials

Shou-Yi Chang, Syun-Ming Jang, Su-Jien Lin, Mong-Song Liang

Journal:

Thin Solid Films

Année:

2004

Langue:

english

Fichier:

PDF, 498 KB

english, 2004

7

Effects of O 2 - and N 2 -Plasma Treatments on Copper Surface

Chiang, Chiu-Chih, Chen, Mao-Chieh, Li, Lain-Jong, Wu, Zhen-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Japanese Journal of Applied Physics

Année:

2004

Langue:

english

Fichier:

PDF, 206 KB

english, 2004

8

Phosphorus doping of epitaxial Si and Si1−xGex at very low pressure

Jang, Syun-Ming, Liao, Kenneth, Reif, Rafael

Journal:

Applied Physics Letters

Année:

1993

Langue:

english

Fichier:

PDF, 665 KB

english, 1993

9

Thermal stability of Si/Si1−xGex/Si heterostructures deposited by very low pressure chemical vapor deposition

Jang, Syun-Ming, Kim, Hyoun-Woo, Reif, Rafael

Journal:

Applied Physics Letters

Année:

1992

Langue:

english

Fichier:

PDF, 734 KB

english, 1992

10

Temperature dependence of Si1−xGex epitaxial growth using very low pressure chemical vapor deposition

Jang, Syun-Ming, Reif, Rafael

Journal:

Applied Physics Letters

Année:

1991

Langue:

english

Fichier:

PDF, 532 KB

english, 1991

11

Effects of hydrogen and deposition pressure on Si1−xGex growth rate

Jang, Syun-Ming, Reif, Rafael

Journal:

Applied Physics Letters

Année:

1992

Langue:

english

Fichier:

PDF, 584 KB

english, 1992

12

Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Wu, Zhen-Cheng, Shiung, Zhi-Wen, Chiang, Chiu-Chih, Wu, Wei-Hao, Chen, Mao-Chieh, Jeng, Shwang-Ming, Chang, Weng, Chou, Pei-Fen, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2001

Langue:

english

Fichier:

PDF, 221 KB

english, 2001

13

Physical and Electrical Characteristics of Methylsilane- and Trimethylsilane-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Wu, Zhen-Cheng, Shiung, Zhi-Wen, Chiang, Chiu-Chih, Wu, Wei-Hao, Chen, Mao-Chieh, Jeng, Shwang-Ming, Chang, Weng, Chou, Pei-Fen, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2001

Langue:

english

Fichier:

PDF, 262 KB

english, 2001

14

Leakage and Breakdown Mechanisms of Cu Comb Capacitors with Bilayer-Structured α-SiCN/α-SiC Cu-Cap Barriers

Chiang, Chiu-Chih, Ko, I-Hsiu, Chen, Mao-Chieh, Wu, Zhen-Cheng, Lu, Yung-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 875 KB

english, 2004

15

TDDB Reliability Improvement of Cu Damascene with a Bilayer-Structured α-SiC:H Dielectric Barrier

Chiang, Chiu-Chih, Chen, Mao-Chieh, Wu, Zhen-Cheng, Li, Lain-Jong, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 372 KB

english, 2004

16

Improvement in Leakage Current and Breakdown Field of Cu-Comb Capacitor Using a Silicon Oxycarbide Dielectric Barrier

Chiang, Chiu-Chih, Ko, I-Hsiu, Chen, Mao-Chieh, Wu, Zhen-Cheng, Lu, Yung-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 433 KB

english, 2004

17

Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiCN:H Films with Different Hydrogen Contents

Chiang, Chiu-Chih, Chen, Mao-Chieh, Ko, Chung-Chi, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

Journal:

Japanese Journal of Applied Physics

Année:

2003

Langue:

english

Fichier:

PDF, 448 KB

english, 2003

18

Physical and Barrier Properties of Plasma Enhanced Chemical Vapor Deposition α-SiC:N:H Films

Chiang, Chiu-Chih, Wu, Zhen-Cheng, Wu, Wei-Hao, Chen, Mao-Chieh, Ko, Chung-Chi, Chen, Hsi-Ping, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

Journal:

Japanese Journal of Applied Physics

Année:

2003

Langue:

english

Fichier:

PDF, 575 KB

english, 2003

19

Low interface trap density Al 2 O 3 /In 0.53 Ga 0.47 As MOS capacitor fabricated on MOCVD-grown InGaAs epitaxial layer on Si substrate

Lin, Yueh-Chin, Huang, Mao-Lin, Chen, Chen-Yu, Chen, Meng-Ku, Lin, Hung-Ta, Tsai, Pang-Yan, Lin, Chun-Hsiung, Chang, Hui-Cheng, Lee, Tze-Liang, Lo, Chia-Chiung, Jang, Syun-Ming, Diaz, Carlos H., Hwang

Journal:

Applied Physics Express

Année:

2014

Langue:

english

Fichier:

PDF, 418 KB

english, 2014

20

Chemical Vapor Deposition of Epitaxial Silicon-Germanium from Silane and Germane

Jang, Syun-Ming

Journal:

Journal of The Electrochemical Society

Année:

1995

Langue:

english

Fichier:

PDF, 979 KB

english, 1995

21

Chemical Vapor Deposition of Epitaxial Silicon-Germanium from Silane and Germane

Jang, Syun-Ming

Journal:

Journal of The Electrochemical Society

Année:

1995

Langue:

english

Fichier:

PDF, 1.66 MB

english, 1995

22

Dielectric and Barrier Properties of Spin-On Organic Aromatic Low Dielectric Constant Polymers FLARE and SiLK

Wu, Zhen-Cheng, Shiung, Zhi-Wen, Wu, Ren-Guay, Liu, Yu-Lin, Wu, Wei-Hao, Tsui, Bing-Yue, Chen, Mao-Chieh, Chang, Weng, Chou, Pei-Fen, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2001

Langue:

english

Fichier:

PDF, 429 KB

english, 2001

23

Physical and Barrier Properties of PECVD Amorphous Silicon-Oxycarbide from Trimethylsilane and CO[sub 2]

Chiang, Chiu-Chih, Ko, I-Hsiu, Chen, Mao-Chieh, Wu, Zhen-Cheng, Lu, Yung-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 141 KB

english, 2004

24

Curing Process Window and Thermal Stability of Porous MSQ-Based Low-Dielectric-Constant Materials

Chang, Shou-Yi, Chou, Tzu-Jen, Lu, Yung-Cheng, Jang, Syun-Ming, Lin, Su-Jien, Liang, Mong-Song

Journal:

Journal of The Electrochemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 307 KB

english, 2004

25

Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiC:H Films from Trimethylsilane and Tetramethylsilane

Chiang, Chiu-Chih, Chen, Mao-Chieh, Ko, Chung-Chi, Wu, Zhen-Cheng, Jang, Syun-Ming, Liang, Mong-Song

Journal:

Japanese Journal of Applied Physics

Année:

2003

Langue:

english

Fichier:

PDF, 451 KB

english, 2003

26

SPIE Proceedings [SPIE Microelectronic Manufacturing '95 - Austin, TX (Wednesday 25 October 1995)] Microelectronic Device and Multilevel Interconnection Technology - Effects of PE-TEOS process on O3-TEOS characteristics and device reliability

Jang, Syun-Ming, Lin, Yu-Min, Lee, Peter, Liu, L. M., Yu, C. H., Lei, Tan F., Lin, M. S., Chen, Ih-Chin, Dixit, Girish A., Doan, Trung T., Sasaki, Nobuo

Année:

1995

Langue:

english

Fichier:

PDF, 619 KB

english, 1995

27

Structural Characterization of Si1-xGex Multilayer Growth On Patterned Substrates by Very-Low-Pressure Cvd

Tsai, Julie A., Jang, Syun-Ming, Tsai, Curtis, Reif, Rafael

Journal:

MRS Proceedings

Année:

1991

Langue:

english

Fichier:

PDF, 1.81 MB

english, 1991

28

SPIE Proceedings [SPIE Microelectronic Manufacturing '99 - Santa Clara, CA (Wednesday 22 September 1999)] Microelectronic Device Technology III - Improvement of ultrathin gate oxide by a novel rapid thermal oxidation process with in-situ steam generation

Yu, Mo-Chium, Jang, Syun-Ming, Diaz, C. H., Yu, C. H., Sun, S. C., Liang, M. S., Burnett, David, Tsuchiya, Toshiaki

Année:

1999

Langue:

english

Fichier:

PDF, 493 KB

english, 1999

29

He plus remote plasma nitridation of ultra-thin gate oxide for deep submicron CMOS technology applications

Ting, Shyh-Fann, Fang, Yean-Kuen, Chen, Chien-Hao, Yang, Chih-Wei, Yu, Mo-Chiun, Jang, Syun-Ming, Yu, Chen-Hua, Liang, Mong-Song, Chen, Sunway, Shih, R.

Journal:

Electronics Letters

Année:

2001

Langue:

english

Fichier:

PDF, 372 KB

english, 2001